Vacuum etching machine uniformity ≥90%, etching factor ≥3.5 times. The vacuum suction device makes the spray operating system generate negative pressure, forming a low suction force, absorbing the etching liquid rich in copper ions, effectively preventing the "puddle". Which can improve production efficiency, quality, etching speed and etching uniformity.
Main parameter
1. Load→developing→fresh chemical rinse→flush sewage→pressure rinse 1,2,3,4→fresh water rinse→inspection→Etching→fresh chemical rinse→pressure rinse 5,6→fresh water rinse→inspection→ Stripping→ flush sewage→pressure rinse 7→acid rinse→pressure rinse 8,9→fresh water rinse→drying→unload
Specification
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Dimension
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19126mm (L) X 2682mm (W) X 2500±25mm (H)
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Transfer speed
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0.6~5Meter/minute(Adjustable)
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Conveyor height
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1100±25mm
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Conveyor width
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700mm
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Wheel diameter:
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∅32mm
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Wheel base
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25mm
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Power supply
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3phase 380V AC 50Hz 83 KW
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consumption
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meter to do:0.80 / m²
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Control cabinet
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Touch screen and PLC
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Transfer Direction
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Left to right
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Number of drainage
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3 for chemical 1 for sewage, total 4
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Drain direction
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load or unload
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note
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1)if no plate, machine will be stop, power saving function
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info@everest-machinery.com
